HIAP – Helsinki International Artist Programme invites art practitioners living and working in Finland to apply for three-month and eleven-month long residencies in the year 2021. The HIAP Residency Programme focuses on visual art but is open for art professionals from other disciplines as well. The programme offers time and space for open-ended research and experimentation, without the requirement to produce finalised pieces of work.

The three-month residencies will take place at HIAP Suomenlinna studio apartments. The selected residents will receive the studio apartment to their use free of charge.

The eleven-month residencies will take place at HIAP Cable Factory. The resident has to cover a monthly fee of 700 € which includes the rent, electricity, water, internet and HIAP residency services.

The residents in Suomenlinna and Cable Factory will have access to HIAP residency services, which include weekly residency community meetings, access to facilities and equipment, meetings with supporting curators and a possibility to take part in the HIAP Open Studios event which usually takes place towards the end of each residency season. Please note that the local residencies are not supported by a travel or working grant, nor include a production budget.

The HIAP Suomenlinna studios are 80 sqm each, furnished, and divided into a working space downstairs and a separate living space with bathroom and kitchenette upstairs. The studios can accommodate up to max. three persons. An impression of some of the spaces you can get here.

The studios at the Cable Factory are 60 sqm each and include a working and living area with a kitchenette, a sleeping loft and a private bathroom. For images of the HIAP Cable Factory studios, please take a look here.

The three-month residency periods at HIAP Suomenlinna are as follows:

• March – April – May 2021 (Spring Season)
• June – July – August 2021 (Summer Season)
• September – October – November 2021 (Autumn Season)

The eleven-month residency periods at HIAP Cable Factory:

• February – December 2021 (resident covers a monthly fee of 700 €)

It’s possible to apply both for a three-month and for an eleven-month residency. The applicants can state their preferred residency periods and location in the application form.

Selections

Applications are accepted from artists and art professionals who are based in Finland (Finnish nationality is not required). Individual artists, collectives or artist duos are welcome to apply. Please note that in case of an artist duo, collective or group, the studio-apartment needs to be shared among the members.

The main criteria for the selection are the quality of the professional practice and the motivation statement.
The applications will be reviewed by invited art professionals (TBA) together with members of the HIAP staff.

The deadline for the applications is Sunday, October 25, 2020 (11:59 pm, GMT +2).

Application Guidelines

To apply, applicants must submit the following by using an online application form:

• Motivation statement
• Short bio and a curriculum vitae
• Portfolio / examples of previous work (optional)

Please write your application in English. Incomplete applications or applications sent by email without using the online application form will not be taken into consideration.

Please note the following guidelines regarding additional material supporting your application:

It is advised that all the supporting material is stored online and can be downloaded via the use of hyperlinks, which are mentioned in the application. Please make sure that the links do not expire before you have received the decision of the Jury.

All image / video / sound samples should be stored and shared online. It is advised to use platforms such as YouTube, Vimeo, etc, so that downloading isn’t required to access the material.

Please note that due to the amount of materials received, we are unable to contact applicants upon receipt of each application, to address individual inquiries regarding submitted proposals, or to comment further upon the selection process.